Description
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Reviewed.1 Forms transparent conductive oxides for photovoltaics by PECVD.10 Safety and handling considerations.11 In combination with WCl6 catalyzes olefin metathesis.2 Allows synthesis of even numbered alkanes.3 Converts acid chlorides to methyl ketones with benzylchlorobis(trip
henyl phosphine)palladium.
4,5 Forms aryl methyl ketones from aryl halides and CO in the presence of dicarbonylbis(triphe
nylphosphine)nickel.
6 For CVD of tin oxide transparent conductive electrodes on glass for photovoltaics and sensors.7 Pyrolyzed in vacuum to tin at 600-750°.8 Pyrolyzed oxidatively to SnO at 350-600°.9 Reference 1. Scott, W. J.; Jones, J. H.; Moretto, A. F. in Encyclopedia of Reagents for Organic Synthesis 1995, Volume 8, 4823-4825. 10. Chandra, H. et al. Am. Vac. Soc. 2008, 55, TFThA10. 11. Kalb, P. et al. Report BNL-52123, 1987 Order NTIS #DE89005936. 2. van Dam, P. et al. J. Chem. Soc., Chem. Commun. 1972, 1221. 3. Gibson, T. et al. J. Org. Chem. 1981, 46, 1821. 4. Milstein, D. et al. J. Org. Chem. 1979, 44, 1613. 5. Labadie, J. et al. J. Am. Chem. Soc. 1983, 105, 6129. 6. Tanaka, M. Synthesis 1981, 47. 7. Inagaki, N. J. Appl. Polym. Sci. 1989, 37, 2341. 8. Svoboda, G. et al. Ind. Eng. Chem. Res. 1992, 31, 19. 9. Borman, C. et al. J. Electrochem. Soc. 1989, 136, 3820. Safety
Hazard Info ihl mus, LCLo: 2,550 mg/m3
Packaging Under Nitrogen ALD Material Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber. Tetramethyltin; Tetramethylstannane
ΔHcomb: 903.5 kcal/mol
ΔHform, gas, 27 °: -13.6 kcal/mol
ΔHvap: 6.8 kcal/mol
Sn-Me bond dissociation energy: 227 kJ/mol
Ea, pyrolysis: 41.1 kcal/mol
Vapor pressure, -21 °C: 10 mm
Vapor pressure, 20 °C: 90 mm
Allows synthesis of even numbered alkanes
Converts acid chlorides to methyl ketones with benzylchlorobis(trip
henyl phosphine)palladium
Forms aryl methyl ketones from aryl halides and CO in the presence of dicarbonylbis(triphe
nylphosphine)nickel
For CVD of tin oxide transparent conductive electrodes on glass for photovoltaics and sensors
Pyrolyzed in vacuum to tin at 600-750 °C
Pyrolyzed oxidatively to SnO at 350-600 °C
Forms transparent conductive oxides for photovoltaics by Plasma-enhanced chemical vapor deposition (PECVD)
Higher purity grade available, SNT7560.1
