Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers.1 Reference 1. Weidman, T. et al. US Patent Appl. 2012/0122302 A1, 2012. Safety
Packaging Under Nitrogen Volatile Carbosilane Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures. 1,3,5-Trisilapentane
; Bis(silylmethyl)sila
ne; Trisilmethylene
Employed in ALD of SiC films
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers
Gelest, Inc.
Done
Datasheet
Description
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers.1 Reference 1. Weidman, T. et al. US Patent Appl. 2012/0122302 A1, 2012. Safety
Packaging Under Nitrogen Volatile Carbosilane Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures. 1,3,5-Trisilapentane
; Bis(silylmethyl)sila
ne; Trisilmethylene
Employed in ALD of SiC films
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers.1 Reference 1. Weidman, T. et al. US Patent Appl. 2012/0122302 A1, 2012. Safety
Packaging Under Nitrogen Volatile Carbosilane Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures. 1,3,5-Trisilapentane
; Bis(silylmethyl)sila
ne; Trisilmethylene
Employed in ALD of SiC films
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water
Application
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers.1
Reference
1. Weidman, T. et al. US Patent Appl. 2012/0122302 A1, 2012.
Safety
Packaging Under Nitrogen
Volatile Carbosilane
Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures.
1,3,5-Trisilapentane; Bis(silylmethyl)silane; Trisilmethylene
Employed in ALD of SiC films
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers
