Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Employed in deposition of SI:C:O:H dielectric films.1 Reference 1. Laxman, R. et al. Semiconductor International 2000, 23, 95. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen
Gelest, Inc.
Done
Datasheet
Description
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Employed in deposition of SI:C:O:H dielectric films.1 Reference 1. Laxman, R. et al. Semiconductor International 2000, 23, 95. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Employed in deposition of SI:C:O:H dielectric films.1 Reference 1. Laxman, R. et al. Semiconductor International 2000, 23, 95. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems
Application
Employed in deposition of SI:C:O:H dielectric films.1
Reference
1. Laxman, R. et al. Semiconductor International 2000, 23, 95.
Safety
