Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Intermediate for ?-SiC:H thin films by PECVD.1 Reference 1. Kim, D. et al. Thin Solid Films 1996, 283, 109. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen Tetramethylsilane; 4MS; TMS
NMR grade
Viscosity: 0.4 cSt
?Hcomb: 3,851 kJ/mol
?Hform: -232 kJ/mol
?Hvap: 26.8 kJ/mol
?Hfus: 6.7 kJ/mol
Photoionization threshold: 8.1 eV
Ce: 1.838 x 10-3
Vapor pressure, 20 °C: 589 mm
Critical temperature: 185 °C
Critical pressure: 33 atm
Heat capacity: 195.2 Jmol-1K-1
Dielectric constant: 1.92
Intermediate for ?-SiC:H thin films by PECVD
Gelest, Inc.
Done
Datasheet
Description
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Intermediate for ?-SiC:H thin films by PECVD.1 Reference 1. Kim, D. et al. Thin Solid Films 1996, 283, 109. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen Tetramethylsilane; 4MS; TMS
NMR grade
Viscosity: 0.4 cSt
?Hcomb: 3,851 kJ/mol
?Hform: -232 kJ/mol
?Hvap: 26.8 kJ/mol
?Hfus: 6.7 kJ/mol
Photoionization threshold: 8.1 eV
Ce: 1.838 x 10-3
Vapor pressure, 20 °C: 589 mm
Critical temperature: 185 °C
Critical pressure: 33 atm
Heat capacity: 195.2 Jmol-1K-1
Dielectric constant: 1.92
Intermediate for ?-SiC:H thin films by PECVD
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems Application Intermediate for ?-SiC:H thin films by PECVD.1 Reference 1. Kim, D. et al. Thin Solid Films 1996, 283, 109. Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen Tetramethylsilane; 4MS; TMS
NMR grade
Viscosity: 0.4 cSt
?Hcomb: 3,851 kJ/mol
?Hform: -232 kJ/mol
?Hvap: 26.8 kJ/mol
?Hfus: 6.7 kJ/mol
Photoionization threshold: 8.1 eV
Ce: 1.838 x 10-3
Vapor pressure, 20 °C: 589 mm
Critical temperature: 185 °C
Critical pressure: 33 atm
Heat capacity: 195.2 Jmol-1K-1
Dielectric constant: 1.92
Intermediate for ?-SiC:H thin films by PECVD
Additional Properties
Hydrolytic Sensitivity 1: no significant reaction with aqueous systems
Application
Intermediate for ?-SiC:H thin films by PECVD.1
Reference
1. Kim, D. et al. Thin Solid Films 1996, 283, 109.
Safety
Hazard Info ihl rat, LC50: >5,000 ppm/4H
Packaging Under Nitrogen
Tetramethylsilane; 4MS; TMS
