Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Source for silicon dioxide by LPCVD.1,3 Precursor for poly(di-t-butoxysilo
xane) photoimageable polymers.2 Reference 1. Smolinsky, G. et al. Mater. Lett. 1986, 4, 256. 2. Senkevich, J. et al. Chem. Mater. 1999, 11, 1814. 3. Sakata, M. et al. J. Photopolymer Sci. and Tech. 1992, 5, 181. Safety
Packaging Under Nitrogen
Gelest, Inc.
Done
Datasheet
Description
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Source for silicon dioxide by LPCVD.1,3 Precursor for poly(di-t-butoxysilo
xane) photoimageable polymers.2 Reference 1. Smolinsky, G. et al. Mater. Lett. 1986, 4, 256. 2. Senkevich, J. et al. Chem. Mater. 1999, 11, 1814. 3. Sakata, M. et al. J. Photopolymer Sci. and Tech. 1992, 5, 181. Safety
Packaging Under Nitrogen
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water Application Source for silicon dioxide by LPCVD.1,3 Precursor for poly(di-t-butoxysilo
xane) photoimageable polymers.2 Reference 1. Smolinsky, G. et al. Mater. Lett. 1986, 4, 256. 2. Senkevich, J. et al. Chem. Mater. 1999, 11, 1814. 3. Sakata, M. et al. J. Photopolymer Sci. and Tech. 1992, 5, 181. Safety
Packaging Under Nitrogen
Additional Properties
Hydrolytic Sensitivity 7: reacts slowly with moisture/water
Application
Source for silicon dioxide by LPCVD.1,3 Precursor for poly(di-t-butoxysiloxane) photoimageable polymers.2
Reference
1. Smolinsky, G. et al. Mater. Lett. 1986, 4, 256. 2. Senkevich, J. et al. Chem. Mater. 1999, 11, 1814. 3. Sakata, M. et al. J. Photopolymer Sci. and Tech. 1992, 5, 181.
Safety
