The LV-DAF delivers fast, versatile autofocus with the Hybrid Auto-Focus system, making the most of two types of auto focus systems. Combining slit projection and contrast detection auto focus, it features large focus range and fast tracking ability. A variety of observation methods are supported, including brightfield, darkfield and differential interference contrast (DIC), as well as various transparent samples.
Hybrid Auto-Focus
There are two common types of auto-focus systems for microscopes: slit projection and contrast detection.
Slit projection system projects a slit image and then detects the shift in the reflected light. This system is useful when a large focal range is necessary.
Contrast detection system projects a slit pattern and then detects the contrast of the reflected light. This system is useful when focus accuracy is needed. This is possible because this auto-focus system is less affected by sample surface variation.
Hybrid Auto-Focus combines the advantages of both systems and makes the most of their paired potential.
| Nikon Metrology | |
|---|---|
| Product Category | Microscopes |
| Product Name | Eclipse LV-DAF Auto Focus Unpright Microscope System |
| Application | Semiconductor |
| Optical Technique | Slit Projection And Contrast Detection Auto Focus |
| Eyepiece Style | Binocular |
