Nikon Metrology Eclipse LV-DAF Auto Focus Unpright Microscope System

Description
The LV-DAF delivers fast, versatile autofocus with the Hybrid Auto-Focus system, making the most of two types of auto focus systems. Combining slit projection and contrast detection auto focus, it features large focus range and fast tracking ability. A variety of observation methods are supported, including brightfield, darkfield and differential interference contrast (DIC), as well as various transparent samples. Hybrid Auto-Focus There are two common types of auto-focus systems for microscopes: slit projection and contrast detection. Slit projection system projects a slit image and then detects the shift in the reflected light. This system is useful when a large focal range is necessary. Contrast detection system projects a slit pattern and then detects the contrast of the reflected light. This system is useful when focus accuracy is needed. This is possible because this auto-focus system is less affected by sample surface variation. Hybrid Auto-Focus combines the advantages of both systems and makes the most of their paired potential.
Description
The LV-DAF delivers fast, versatile autofocus with the Hybrid Auto-Focus system, making the most of two types of auto focus systems. Combining slit projection and contrast detection auto focus, it features large focus range and fast tracking ability. A variety of observation methods are supported, including brightfield, darkfield and differential interference contrast (DIC), as well as various transparent samples. Hybrid Auto-Focus There are two common types of auto-focus systems for microscopes: slit projection and contrast detection. Slit projection system projects a slit image and then detects the shift in the reflected light. This system is useful when a large focal range is necessary. Contrast detection system projects a slit pattern and then detects the contrast of the reflected light. This system is useful when focus accuracy is needed. This is possible because this auto-focus system is less affected by sample surface variation. Hybrid Auto-Focus combines the advantages of both systems and makes the most of their paired potential.

Suppliers

Company
Product
Description
Supplier Links
Eclipse LV-DAF Auto Focus Unpright Microscope System -  - Nikon Metrology
Leuven, Belgium
Eclipse LV-DAF Auto Focus Unpright Microscope System
Eclipse LV-DAF Auto Focus Unpright Microscope System
The LV-DAF delivers fast, versatile autofocus with the Hybrid Auto-Focus system, making the most of two types of auto focus systems. Combining slit projection and contrast detection auto focus, it features large focus range and fast tracking ability. A variety of observation methods are supported, including brightfield, darkfield and differential interference contrast (DIC), as well as various transparent samples. Hybrid Auto-Focus There are two common types of auto-focus systems for microscopes: slit projection and contrast detection. Slit projection system projects a slit image and then detects the shift in the reflected light. This system is useful when a large focal range is necessary. Contrast detection system projects a slit pattern and then detects the contrast of the reflected light. This system is useful when focus accuracy is needed. This is possible because this auto-focus system is less affected by sample surface variation. Hybrid Auto-Focus combines the advantages of both systems and makes the most of their paired potential.

The LV-DAF delivers fast, versatile autofocus with the Hybrid Auto-Focus system, making the most of two types of auto focus systems. Combining slit projection and contrast detection auto focus, it features large focus range and fast tracking ability. A variety of observation methods are supported, including brightfield, darkfield and differential interference contrast (DIC), as well as various transparent samples.

Hybrid Auto-Focus

There are two common types of auto-focus systems for microscopes: slit projection and contrast detection.

Slit projection system projects a slit image and then detects the shift in the reflected light. This system is useful when a large focal range is necessary.

Contrast detection system projects a slit pattern and then detects the contrast of the reflected light. This system is useful when focus accuracy is needed. This is possible because this auto-focus system is less affected by sample surface variation.

Hybrid Auto-Focus combines the advantages of both systems and makes the most of their paired potential.

Supplier's Site

Technical Specifications

  Nikon Metrology
Product Category Microscopes
Product Name Eclipse LV-DAF Auto Focus Unpright Microscope System
Application Semiconductor
Optical Technique Slit Projection And Contrast Detection Auto Focus
Eyepiece Style Binocular
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