Matexcel Microscopy Reference Standard 850 ASS-850

Description
Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon (3 x 4mm. Line height: approximately 30 nm (not calibrated). Line width: Approximately 130 nm (not calibrated).) Mounting: Unmounted
Datasheet
Description
Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon (3 x 4mm. Line height: approximately 30 nm (not calibrated). Line width: Approximately 130 nm (not calibrated).) Mounting: Unmounted
Datasheet

Suppliers

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Microscopy Reference Standard 850 - ASS-850 - Matexcel
Shirley, NY, United States
Microscopy Reference Standard 850
ASS-850
Microscopy Reference Standard 850 ASS-850
Pitch: 700 nm Surface feature: Hardened photoresist ridges covered with Tungsten Substrate: Silicon (3 x 4mm. Line height: approximately 30 nm (not calibrated). Line width: Approximately 130 nm (not calibrated).) Mounting: Unmounted

Pitch: 700 nm
Surface feature: Hardened photoresist ridges covered with Tungsten
Substrate: Silicon (3 x 4mm.
Line height: approximately 30 nm (not calibrated).
Line width: Approximately 130 nm (not calibrated).)
Mounting: Unmounted

Supplier's Site Datasheet

Technical Specifications

  Matexcel
Product Category Microscopy and Metallography Sample Preparation Equipment
Product Number ASS-850
Product Name Microscopy Reference Standard 850
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