Iwaki America and Walchem, IWAKI America Inc PDS Photoresist Dispensing System

Description
Superior resist handling The use of high-torque, stepper motor technology results in a consistent controllable discharge volume. The discharge volume is not affected by changes in viscosity or by filter performance. Repeatable accuracy of 0.3% of the discharge volume is maintained at all times. Repeated precision: ±0.3% (F.S.) Linearity: ±0.5% (F.S.) Resolution: 0.01 ml or below High Purity The pump end utilizes a tubephragm design eliminating dead volume and low velocity areas where resist can stagnate. This prevents the collection of particles and allows the pumps to maintain the highest purity possible. Flexibility in Applications The discharge velocity as well as volume are easily adjusted to expand the capabilities to many resist-coating processes, including the application of small amounts of resist in a short period of time.

Suppliers

Company
Product
Description
Supplier Links
PDS Photoresist Dispensing System -  - Iwaki America and Walchem, IWAKI America Inc
Holliston, MA, USA
PDS Photoresist Dispensing System
PDS Photoresist Dispensing System
Superior resist handling The use of high-torque, stepper motor technology results in a consistent controllable discharge volume. The discharge volume is not affected by changes in viscosity or by filter performance. Repeatable accuracy of 0.3% of the discharge volume is maintained at all times. Repeated precision: ±0.3% (F.S.) Linearity: ±0.5% (F.S.) Resolution: 0.01 ml or below High Purity The pump end utilizes a tubephragm design eliminating dead volume and low velocity areas where resist can stagnate. This prevents the collection of particles and allows the pumps to maintain the highest purity possible. Flexibility in Applications The discharge velocity as well as volume are easily adjusted to expand the capabilities to many resist-coating processes, including the application of small amounts of resist in a short period of time.

Superior resist handling
The use of high-torque, stepper motor technology results in a consistent controllable discharge volume. The discharge volume is not affected by changes in viscosity or by filter performance. Repeatable accuracy of 0.3% of the discharge volume is maintained at all times.

  • Repeated precision: ±0.3% (F.S.)
  • Linearity: ±0.5% (F.S.)
  • Resolution: 0.01 ml or below

High Purity
The pump end utilizes a tubephragm design eliminating dead volume and low velocity areas where resist can stagnate. This prevents the collection of particles and allows the pumps to maintain the highest purity possible.
Flexibility in Applications
The discharge velocity as well as volume are easily adjusted to expand the capabilities to many resist-coating processes, including the application of small amounts of resist in a short period of time.

Supplier's Site

Technical Specifications

  Iwaki America and Walchem, IWAKI America Inc
Product Category Liquid Handling Pumps
Product Name PDS Photoresist Dispensing System
Pump Type Metering Pump; Positive Displacement Pump
Discharge Pressure 21.8 psi (15.3 m of Water)
Liquid Flow 0.002 to 0.063 GPM (0.01 to 0.24 L/min)
Media Temperature 59 to 77 F (15 to 25 C)
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