Hamamatsu Photonics Europe Thickness measurement system C11295

Description
The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.
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Description
The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.
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Thickness measurement system - C11295 - Hamamatsu Photonics Europe
Herrsching am Ammersee, Germany
Thickness measurement system
C11295
Thickness measurement system C11295
The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.

The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.

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Technical Specifications

  Hamamatsu Photonics Europe
Product Category Dimensional Gages and Instruments
Product Number C11295
Product Name Thickness measurement system
Measurement Scale / Units Metric
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