ETEL S.A. Z3TM Combined Module

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Z3TM Combined Module -  - ETEL S.A.
Môtiers, Switzerland
Z3TM Combined Module
The Z3TH Combined Module is enlarging the scope of modules that can sit on top of the existing XY platforms. The Z3TH, 4 degrees of freedom module, provides 364° Theta rotation, double Z-axes, a coarse one for wafer loading and unloading, and a fine one for focus adjustment, as well as a Tip and Tilt correction over ±0.1°. This Z3TH module is a nice alternative to piezo based Z actuators, eliminating the hysteresis and non-linearity in open loop while offering better tracking error during movement, repeatability, and move and settle performance yet over much longer travels. The Z3TH module is primarily dedicated to front-end type of applications and provides a right solution to cope with any applications requiring: Alignment between a process tool and a substrate Mapping of flatness Move and settle improvement First applications are related to back-end lithography and wafer process control. Characteristics 364° Theta rotation Tip and tilt correction over ±0.1° for leveling and for move and settle improvement Vacuum feed-through to the chuck level Double Z integration: coarse travel for loading/unloading and fine travel for focus adjustment ISO class 1 clean room compatibility Low radial axial and radial runout of ±1 µm

The Z3TH Combined Module is enlarging the scope of modules that can sit on top of the existing XY platforms. The Z3TH, 4 degrees of freedom module, provides 364° Theta rotation, double Z-axes, a coarse one for wafer loading and unloading, and a fine one for focus adjustment, as well as a Tip and Tilt correction over ±0.1°. This Z3TH module is a nice alternative to piezo based Z actuators, eliminating the hysteresis and non-linearity in open loop while offering better tracking error during movement, repeatability, and move and settle performance yet over much longer travels.

The Z3TH module is primarily dedicated to front-end type of applications and provides a right solution to cope with any applications requiring:

  • Alignment between a process tool and a substrate
  • Mapping of flatness
  • Move and settle improvement

First applications are related to back-end lithography and wafer process control.

Characteristics

  • 364° Theta rotation
  • Tip and tilt correction over ±0.1° for leveling and for move and settle improvement
  • Vacuum feed-through to the chuck level
  • Double Z integration: coarse travel for loading/unloading and fine travel for focus adjustment
  • ISO class 1 clean room compatibility
  • Low radial axial and radial runout of ±1 µm
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Technical Specifications

  ETEL S.A.
Product Category Linear Slides and Linear Stages
Product Name Z3TM Combined Module
Motor Type Electro-Magnet
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