ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
| CSA Group | |
|---|---|
| Product Category | Standards and Technical Documents |
| Product Number | ISO 14606:2015 |
| Product Name | Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials |
