Semiconductor deposition processes use a combination of volatile precursor gases, plasma, and high temperature to layer high quality thin films onto wafers. Deposition chambers and wafer handling tools need durable ceramic components to stand up to these challenging environments.
CoorsTek provides custom engineered OEM components for:
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)
Electrochemical Plating / Electrochemical Deposition (ECP, ECD)
Atomic Layer Deposition (ALD)
VACUUM BREAK FILTERS
Vacuum break filters are diffusers used in deposition and other vacuum processes to enable quick, clean venting of vacuum chambers:
Reduce particle adders on wafers for higher yield
Speed chamber venting for higher throughput
CoorsTek vacuum break filters use porous alumina (Al2O3) and porous silicon carbide (SiC) ceramics specifically engineered for various types and sizes of vacuum chambers:
Tube type (for load-lock, transfer, and process chambers)
Disk type (for narrow space chambers)
Quartz type (for thermal processing and LPCVD chambers)
RECOMMENDED DEPOSITION CHAMBER COMPONENT MATERIALS
CoorsTek uses a broad portfolio of semiconductor grade ceramics including:
Aluminas (Al2O3): PlasmaPure™, Sapphal™, and other high-purity compositions
Aluminum Nitride (AlN)
PureSiC® Silicon Carbide (SiC)
Coatings: CVD SiC, ESD-Safe, Yttria
Semiconductor deposition processes use a combination of volatile precursor gases, plasma, and high temperature to layer high quality thin films onto wafers. Deposition chambers and wafer handling tools need durable ceramic components to stand up to these challenging environments.
CoorsTek provides custom engineered OEM components for:
- Chemical Vapor Deposition (CVD)
- Physical Vapor Deposition (PVD)
- Electrochemical Plating / Electrochemical Deposition (ECP, ECD)
- Atomic Layer Deposition (ALD)
VACUUM BREAK FILTERS
Vacuum break filters are diffusers used in deposition and other vacuum processes to enable quick, clean venting of vacuum chambers:
- Reduce particle adders on wafers for higher yield
- Speed chamber venting for higher throughput
CoorsTek vacuum break filters use porous alumina (Al2O3) and porous silicon carbide (SiC) ceramics specifically engineered for various types and sizes of vacuum chambers:
- Tube type (for load-lock, transfer, and process chambers)
- Disk type (for narrow space chambers)
- Quartz type (for thermal processing and LPCVD chambers)
RECOMMENDED DEPOSITION CHAMBER COMPONENT MATERIALS
CoorsTek uses a broad portfolio of semiconductor grade ceramics including:
- Aluminas (Al2O3): PlasmaPure™, Sapphal™, and other high-purity compositions
- Aluminum Nitride (AlN)
- PureSiC® Silicon Carbide (SiC)
- Coatings: CVD SiC, ESD-Safe, Yttria
