CoorsTek Process Tubes For Diffusion & LPCVD Equipment

Process tubes are used in the reaction zones of semiconductor furnaces - requiring high purity and thermal stability. Some processing equipment uses liners within the process tubes. Smaller, traditional process tubes typically use quartz. Larger, higher performance tubes frequently use high-performance silicon carbide (SiC) with superior strength, rigidity, and durability. Traditional diffusion, LPCVD (Low Pressure Chemical Vapor Deposition), and other batch semiconductor applications require the thermal and purity properties of advanced ceramics. Recommended Diffusion & LPCVD Materials TPSS, UltraClean™ Recrystallized Silicon Carbide PureSiC® CVD Silicon Carbide Coatings: CVD SiC Quartz