CoorsTek Photomask Substrates For Lithography & Wafer Inspection Components

CoorsTek photomask substrates are made from high-purity synthetic quartz glass to deliver superior UV and visible light transmittance, thermal stability, electrical insulation, low birefringence, and durable chemical stability. Advanced, scalable polishing technology makes these photomask substrates ideal for microscopic patterning from wafers to large flat panel displays (FPD). Ceramic Components for Lithography & Wafer Inspection Perfect for next-generation lithography and wafer-handling applications, our ultra-pure ceramic components ensure minimal contamination and provide exceptionally long life performance. LITHOGRAPHY & WAFER INSPECTION COMPONENTS Resistant to chemical attack and thermally stable, our high-purity ceramic components are ideal for lithography processing, wafer handling (low contamination), and wafer inspection (extreme durability and hardness, dimensionally stable). RECOMMENDED LITHOGRAPHY & WAFER INSPECTION MATERIALS High-Purity Aluminas UltraClean™ Recrystallized Silicon Carbide CeraSiC, UltraSiC™ Direct Sintered Silicon Carbides