Semiconductor deposition processes use a combination of volatile precursor gases, plasma, and high temperature to layer high quality thin films onto wafers. Deposition chambers and wafer handling tools need durable ceramic components to stand up to these challenging environments.
CoorsTek provides custom engineered OEM components for:
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)
Electrochemical Plating / Electrochemical Deposition (ECP, ECD)
Atomic Layer Deposition (ALD)
PEDESTAL HEATERS
Heaters for deposition equipment demand uniform thermal distribution across the wafer, along with high purity and plasma resistance. CoorsTek heaters are engineered to specific OEM requirements for up to 300 mm wafer diameters. Aluminum nitride (AlN) is commonly used in these heaters based on its unique combination of high thermal conductivity and strong electrical resistance.
RECOMMENDED DEPOSITION CHAMBER COMPONENT MATERIALS
CoorsTek uses a broad portfolio of semiconductor grade ceramics including:
Aluminas (Al2O3): PlasmaPure™, Sapphal™, and other high-purity compositions
Aluminum Nitride (AlN)
PureSiC® Silicon Carbide (SiC)
Coatings: CVD SiC, ESD-Safe, Yttria
Semiconductor deposition processes use a combination of volatile precursor gases, plasma, and high temperature to layer high quality thin films onto wafers. Deposition chambers and wafer handling tools need durable ceramic components to stand up to these challenging environments.
CoorsTek provides custom engineered OEM components for:
- Chemical Vapor Deposition (CVD)
- Physical Vapor Deposition (PVD)
- Electrochemical Plating / Electrochemical Deposition (ECP, ECD)
- Atomic Layer Deposition (ALD)
PEDESTAL HEATERS
Heaters for deposition equipment demand uniform thermal distribution across the wafer, along with high purity and plasma resistance. CoorsTek heaters are engineered to specific OEM requirements for up to 300 mm wafer diameters. Aluminum nitride (AlN) is commonly used in these heaters based on its unique combination of high thermal conductivity and strong electrical resistance.
RECOMMENDED DEPOSITION CHAMBER COMPONENT MATERIALS
CoorsTek uses a broad portfolio of semiconductor grade ceramics including:
- Aluminas (Al2O3): PlasmaPure™, Sapphal™, and other high-purity compositions
- Aluminum Nitride (AlN)
- PureSiC® Silicon Carbide (SiC)
- Coatings: CVD SiC, ESD-Safe, Yttria
