CoorsTek Ceramic Focus Rings for Plasma Etch Equipment

Focus/edge rings are designed to improve etch uniformity around the wafer edge or perimeter. When used with an electrostatic chuck (e-chuck), the wafer rests on the edge focus ring - held in place by the electrostatic charge. ADVANCED CERAMIC COMPONENTS CoorsTek advanced, high-purity ceramic components are built to withstand the extreme environments in plasma etch (or "dry" etch) chambers — including vapor phase chemical etchants, high voltage RF (radio frequency) and microwave plasma, volatile byproducts, and aggressive cleaning cycles. EXAMPLE ETCH PROCESS MATERIALS Plasma Pure™ UC Alumina Low Loss Tangent Alumina PureSiC® CVD Silicon Carbide Exyria™ Yttria & Yttria Coatings Coatings: CVD SiC, ESD-Safe UltraClean™ Recrystallized SiC StatSafe™ ESD-Safe Ceramics Single Crystal Silicon