CoorsTek Ceramic Etch Windows for Plasma Etch Equipment


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Ceramic Etch Windows for Plasma Etch Equipment -  - CoorsTek
Golden, CO, USA
Ceramic Etch Windows for Plasma Etch Equipment
Windows are chamber lids designed to transmit RF (radio frequency) and microwave energy into the plasma etch chamber while resisting erosion from the harsh plasma etch environment. An effective window has a low loss tangent (high transmittance) across RF and microwave frequencies. Otherwise, energy may be absorbed and converted to excessive heat — degrading both the process (lost RF energy) and components (excess heat and thermal gradients). ADVANCED CERAMIC COMPONENTS CoorsTek advanced, high-purity ceramic components are built to withstand the extreme environments in plasma etch (or "dry" etch) chambers — including vapor phase chemical etchants, high voltage RF (radio frequency) and microwave plasma, volatile byproducts, and aggressive cleaning cycles. EXAMPLE ETCH PROCESS MATERIALS Plasma Pure™ UC Alumina Low Loss Tangent Alumina PureSiC® CVD Silicon Carbide Exyria™ Yttria & Yttria Coatings Coatings: CVD SiC, ESD-Safe UltraClean™ Recrystallized SiC StatSafe™ ESD-Safe Ceramics Single Crystal Silicon
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Technical Specifications

Product Category Specialty Ceramics
Product Number
Product Name Ceramic Etch Windows for Plasma Etch Equipment
Applications Chemical or material processing
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