CoorsTek Ceramic Deposition Equipment Components


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Ceramic Deposition Equipment Components -  - CoorsTek
Golden, CO, USA
Ceramic Deposition Equipment Components
Semiconductor deposition processes use a combination of volatile precursor gases, plasma, and high temperature to layer high quality thin films onto wafers. Deposition chambers and wafer handling tools need durable ceramic components to stand up to these challenging environments. CoorsTek provides custom engineered OEM components for: Chemical Vapor Deposition (CVD) Physical Vapor Deposition (PVD) Electrochemical Plating / Electrochemical Deposition (ECP, ECD) Atomic Layer Deposition (ALD) DEPOSITION CHAMBER COMPONENTS Everywhere process equipment is exposed to the harsh deposition conditions or contacts wafers needs the inert, durable properties of engineered ceramics. Chamber lids (domes) Chamber liners Deposition rings Gas distribution plates (showerheads) Pedestal heaters Plating insulators Vacuum break filters RECOMMENDED DEPOSITION CHAMBER COMPONENT MATERIALS CoorsTek uses a broad portfolio of semiconductor grade ceramics including: Aluminas (Al2O3): PlasmaPure™, Sapphal™, and other high-purity compositions Aluminum Nitride (AlN) PureSiC® Silicon Carbide (SiC) Coatings: CVD SiC, ESD-Safe, Yttria
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Technical Specifications

Product Category Specialty Ceramics
Product Number
Product Name Ceramic Deposition Equipment Components
Applications Chemical or material processing
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