CoorsTek advanced, high-purity ceramic components are built to withstand the extreme environments in plasma etch (or "dry" etch) chambers — including vapor phase chemical etchants, high voltage RF (radio frequency) and microwave plasma, volatile byproducts, and aggressive cleaning cycles.
ETCH PROCESS COMPONENTS
Minimize contamination and unscheduled maintenance with high- purity components engineered for the rigors of plasma etch processing, including:
Focus rings
Nozzles
Shields
Showerheads
Windows / Lids
Other custom components
EXAMPLE ETCH PROCESS MATERIALS
Plasma Pure™ UC Alumina
Low Loss Tangent Alumina
PureSiC® CVD Silicon Carbide
Exyria™ Yttria & Yttria Coatings
Coatings: CVD SiC, ESD-Safe
UltraClean™ Recrystallized SiC
StatSafe™ ESD-Safe Ceramics
Single Crystal Silicon
CoorsTek advanced, high-purity ceramic components are built to withstand the extreme environments in plasma etch (or "dry" etch) chambers — including vapor phase chemical etchants, high voltage RF (radio frequency) and microwave plasma, volatile byproducts, and aggressive cleaning cycles.
ETCH PROCESS COMPONENTS
Minimize contamination and unscheduled maintenance with high- purity components engineered for the rigors of plasma etch processing, including:
- Focus rings
- Nozzles
- Shields
- Showerheads
- Windows / Lids
- Other custom components
EXAMPLE ETCH PROCESS MATERIALS
- Plasma Pure™ UC Alumina
- Low Loss Tangent Alumina
- PureSiC® CVD Silicon Carbide
- Exyria™ Yttria & Yttria Coatings
- Coatings: CVD SiC, ESD-Safe
- UltraClean™ Recrystallized SiC
- StatSafe™ ESD-Safe Ceramics
- Single Crystal Silicon
