CoorsTek Ceramic Components for Plasma Etch Equipment

CoorsTek advanced, high-purity ceramic components are built to withstand the extreme environments in plasma etch (or "dry" etch) chambers — including vapor phase chemical etchants, high voltage RF (radio frequency) and microwave plasma, volatile byproducts, and aggressive cleaning cycles. ETCH PROCESS COMPONENTS Minimize contamination and unscheduled maintenance with high- purity components engineered for the rigors of plasma etch processing, including: Focus rings Nozzles Shields Showerheads Windows / Lids Other custom components EXAMPLE ETCH PROCESS MATERIALS Plasma Pure™ UC Alumina Low Loss Tangent Alumina PureSiC® CVD Silicon Carbide Exyria™ Yttria & Yttria Coatings Coatings: CVD SiC, ESD-Safe UltraClean™ Recrystallized SiC StatSafe™ ESD-Safe Ceramics Single Crystal Silicon