Brooks Instrument Metal Sealed Thermal Mass Flow Controller & Meter, GF100 Series GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121

Description
Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFloTM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy. The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity. Features Long-term zero stability of <±0.5% full scale per year Settling times: 700 ms - <1 second Full-scale flow rates up to 300 slpm All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy Local display Optional SDS gas delivery DeviceNetTM, RS-485 L-Protocol and analog interfaces Benefits High-performance components marathon tested to seven times semiconductor industry standards for reliability All metal, corrosion resistant flow path with reduced surface area and unswept volumes ensures faster dry-down during purge steps With MultiFloTM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating MFCs Highly configurable platform enables drop-in replacement and upgrade of most brands of metal sealed MFCs, including the former Celerity, Mykrolis, Tylan and UNIT brands GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting Applications Semiconductor etch tools Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD) Physical vapor deposition (PVD) systems Epitaxial process systems

Suppliers

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Metal Sealed Thermal Mass Flow Controller & Meter, GF100 Series - GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121 - Brooks Instrument
Hatfield, PA, USA
Metal Sealed Thermal Mass Flow Controller & Meter, GF100 Series
GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121
Metal Sealed Thermal Mass Flow Controller & Meter, GF100 Series GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121
Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFloTM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy. The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity. Features Long-term zero stability of <±0.5% full scale per year Settling times: 700 ms - <1 second Full-scale flow rates up to 300 slpm All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy Local display Optional SDS gas delivery DeviceNetTM, RS-485 L-Protocol and analog interfaces Benefits High-performance components marathon tested to seven times semiconductor industry standards for reliability All metal, corrosion resistant flow path with reduced surface area and unswept volumes ensures faster dry-down during purge steps With MultiFloTM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating MFCs Highly configurable platform enables drop-in replacement and upgrade of most brands of metal sealed MFCs, including the former Celerity, Mykrolis, Tylan and UNIT brands GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting Applications Semiconductor etch tools Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD) Physical vapor deposition (PVD) systems Epitaxial process systems

Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFloTM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy.

The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity.

Features

  • Long-term zero stability of <±0.5% full scale per year
  • Settling times: 700 ms - <1 second
  • Full-scale flow rates up to 300 slpm
  • All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish
  • Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
  • MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
  • Local display
  • Optional SDS gas delivery
  • DeviceNetTM, RS-485 L-Protocol and analog interfaces

Benefits

  • High-performance components marathon tested to seven times semiconductor industry standards for reliability
  • All metal, corrosion resistant flow path with reduced surface area and unswept volumes ensures faster dry-down during purge steps
  • With MultiFloTM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating MFCs
  • Highly configurable platform enables drop-in replacement and upgrade of most brands of metal sealed MFCs, including the former Celerity, Mykrolis, Tylan and UNIT brands
  • GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes
  • Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting

Applications

  • Semiconductor etch tools
  • Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
  • Physical vapor deposition (PVD) systems
  • Epitaxial process systems
Supplier's Site

Technical Specifications

  Brooks Instrument
Product Category Flow Meters
Product Number GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121
Product Name Metal Sealed Thermal Mass Flow Controller & Meter, GF100 Series
Meter Technology Thermal
Meter Type Mass Flow Meter
Features Controller
Approvals EC Directive 2004/108/EC, CE: EN61326-1: 2006 (FCC Part 15 & Canada IC-subset of CE testing)
Product Standards RoHS
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