AENOR UNE-EN 62047-16:2015

Description
Semiconductor devices - Micro-electromechani cal devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)
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Description
Semiconductor devices - Micro-electromechani cal devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)
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UNE-EN 62047-16:2015 -  - AENOR
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UNE-EN 62047-16:2015
UNE-EN 62047-16:2015
Semiconductor devices - Micro-electromechani cal devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)

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Technical Specifications

  AENOR
Product Category Standards and Technical Documents
Product Name UNE-EN 62047-16:2015
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