With breakthrough stability, accuracy, and reliability, Crystal innovation powered large area dual-magnetron applications into the high-tech era.
Single box solution
Robust communications (Analog, Profibus, RS-232, 422, 485)
Water and air cooling combined
Precise power control is essential for high-density, uniform, reactively sputtered films. The Crystal power supply offers process engineers and operators quick yet stable power, fast arc detection, and low arc energy, resulting in industry-leading repeatability, higher throughput, and better yield. With power granularity from 60 to 180 kW, Crystal power supplies can match the demands of your low-e coating applications. Exceptional stability, flexibility, and fast arc handling and recovery have made Crystal a go-to unit.
Benefits
Optimized process stability and yield
Advanced arc management
Reduced cost of ownership through lower consumable costs
Easy, simple setup
World-class service, support, and training
Features
60, 100, 120, 150, and 180 kW models
Fast arc detection and response (microsecond scale)
Wide output impedance range
Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
Single-box solution — no hardware or setting adjustments required when changing sputtering materials
With breakthrough stability, accuracy, and reliability, Crystal innovation powered large area dual-magnetron applications into the high-tech era.
- Single box solution
- Robust communications (Analog, Profibus, RS-232, 422, 485)
- Water and air cooling combined
Precise power control is essential for high-density, uniform, reactively sputtered films. The Crystal power supply offers process engineers and operators quick yet stable power, fast arc detection, and low arc energy, resulting in industry-leading repeatability, higher throughput, and better yield. With power granularity from 60 to 180 kW, Crystal power supplies can match the demands of your low-e coating applications. Exceptional stability, flexibility, and fast arc handling and recovery have made Crystal a go-to unit.
Benefits
- Optimized process stability and yield
- Advanced arc management
- Reduced cost of ownership through lower consumable costs
- Easy, simple setup
- World-class service, support, and training
Features
- 60, 100, 120, 150, and 180 kW models
- Fast arc detection and response (microsecond scale)
- Wide output impedance range
- Suitable for all processes (ZnO, SnO2, TiO2, AI203, Si3N4, Si, SiO2)
- Single-box solution — no hardware or setting adjustments required when changing sputtering materials
