Continuously filters process chemistry to increase purity and maximize product yield
Reduced acid consumption generally pays for bath in three months
Select semiconductor-grade natural polypropylene or PVDF seamless process tank
360° serrated overflow weir enhances particulate removal
Pump/filter assembly is easily removed for quick filter change
Uniform flow return system ensures a consistent laminar flow across every wafer at every location—no eddies or dead spots
This filtered bath is ideal for oxide etching and other processes using HF acid. Its recirculating system continuously filters the process chemistry to ensure purity and reduce consumption. Depending on 10" (254 mm) filter cartridge selected, these systems provide up to 0.2µ absolute filtration.
- Continuously filters process chemistry to increase purity and maximize product yield
- Reduced acid consumption generally pays for bath in three months
- Select semiconductor-grade natural polypropylene or PVDF seamless process tank
- 360° serrated overflow weir enhances particulate removal
- Pump/filter assembly is easily removed for quick filter change
- Uniform flow return system ensures a consistent laminar flow across every wafer at every location—no eddies or dead spots
This filtered bath is ideal for oxide etching and other processes using HF acid. Its recirculating system continuously filters the process chemistry to ensure purity and reduce consumption. Depending on 10" (254 mm) filter cartridge selected, these systems provide up to 0.2µ absolute filtration.
