The development of fine grain size in PVD sputtering targets has been shown to improve the processing performance of the target in the sputtering chamber. Fine grain size is most commonly developed in a metal through the introduction of mechanical work and the addition of heat. This allows the metal to recrystallize into small grains...
| Materion Corporation | |
|---|---|
| Product Category | Semiconducting Materials |
| Product Name | VCT™ |
