JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products.
Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective closed loop process. Ultra clean vapor is remotely generated and thenintroduced into a sealed drying chamber. The closed loop system allows fresh IPA vapor to rinse the surface to be dried, penetrating the surface areas and absorbing the moisture. A low pressure vacuum pulls any remaining moisture from the sealed chamber and away from the product being dried.
Options
Charcoal Filter
Color User Interface Panel
Bulk Chemical Dispense
Safety
Meets FM Requirements
No Vapor Present during Load/Unload
Sealed Vessel with Closed Loop Process
Low Emissions (less than 1 lb per day)
Indirect Heating of IPA
CO2 Fire Suppression System
Automated Lid with Safety Interlocks
Meets NFPA Class I Div II Drying Aplications
Silicon Wafer
III-Compound Wafer
MEMS
Glass Substrates
Disc Drives
Optics and more
JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products.
Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective closed loop process. Ultra clean vapor is remotely generated and thenintroduced into a sealed drying chamber. The closed loop system allows fresh IPA vapor to rinse the surface to be dried, penetrating the surface areas and absorbing the moisture. A low pressure vacuum pulls any remaining moisture from the sealed chamber and away from the product being dried.
Options
- Charcoal Filter
- Color User Interface Panel
- Bulk Chemical Dispense
Safety
- Meets FM Requirements
- No Vapor Present during Load/Unload
- Sealed Vessel with Closed Loop Process
- Low Emissions (less than 1 lb per day)
- Indirect Heating of IPA
- CO2 Fire Suppression System
- Automated Lid with Safety Interlocks
- Meets NFPA Class I Div II
Drying Aplications
- Silicon Wafer
- III-Compound Wafer
- MEMS
- Glass Substrates
- Disc Drives
- Optics and more
