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Conax Technologies Ion Implant Thermocouple for Axcelis Implanter

Description
Ion Implantation is a critical step in the manufacture of semiconductors. High energy implantation can heat the wafer and cause problems that lead to yield reduction. Monitoring the temperature of wafers during implantation is required to determine the amount of wafer cooling that is required. Small-diameter, fast-response, spring-loaded thermocouples such as those shown above are an economical and reliable way to monitor ion implantation tool temperature.
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Ion Implant Thermocouple for Axcelis Implanter -  - Conax Technologies
Buffalo, NY, United States
Ion Implant Thermocouple for Axcelis Implanter
Ion Implant Thermocouple for Axcelis Implanter
Ion Implantation is a critical step in the manufacture of semiconductors. High energy implantation can heat the wafer and cause problems that lead to yield reduction. Monitoring the temperature of wafers during implantation is required to determine the amount of wafer cooling that is required. Small-diameter, fast-response, spring-loaded thermocouples such as those shown above are an economical and reliable way to monitor ion implantation tool temperature.

Ion Implantation is a critical step in the manufacture of semiconductors. High energy implantation can heat the wafer and cause problems that lead to yield reduction. Monitoring the temperature of wafers during implantation is required to determine the amount of wafer cooling that is required.

Small-diameter, fast-response, spring-loaded thermocouples such as those shown above are an economical and reliable way to monitor ion implantation tool temperature.

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Technical Specifications

  Conax Technologies
Product Category Thermocouple Temperature Probes
Product Name Ion Implant Thermocouple for Axcelis Implanter
Probe Configuration Straight Probe
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