GRISH CMP slurry is mainly based on colloids. The formula made through scientific proportioning can ensure the stability of pH value during the polishing process, thereby ensuring the stability of the polishing rate and saving time. CMP slurries are widely used in mechanical polishing of various nanoscale materials, such as sapphire materials, metals, composite crystals, etc.
| Beijing Grish Hitech Co., Ltd. | |
|---|---|
| Product Category | Abrasive Compounds and Abrasive Slurries |
| Product Name | CMP Slurry |
| Type | Polishing |
