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MacDermid Alpha Electronics Solutions MICROFAB ® SN-350

Description
MICROFAB SN-350 is a high-speed, low alpha pure tin plating process that produces compact grain structures and smooth surface morphology, which is used for flip chip bumping and microbump applications. Product Overview MICROFAB SN-350 Tin bump plating bath is an organic sulfonate-based electrolyte, for high speed electro-deposition of smooth fine-grained, uniform Tin bumps. The chemistry is robust enough for both bumping and capping a wide range of patterned wafers. It exhibits good post-reflow with-in die (WID) bump thickness uniformity over a wide range of wafer types, which demonstrates its suitability for high-volume manufacturing. Features Pure tin Low alpha Smooth deposit Excellent coplanarity Low surface roughness High speed
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MICROFAB ® SN-350 -  - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
MICROFAB ® SN-350
MICROFAB ® SN-350
MICROFAB SN-350 is a high-speed, low alpha pure tin plating process that produces compact grain structures and smooth surface morphology, which is used for flip chip bumping and microbump applications. Product Overview MICROFAB SN-350 Tin bump plating bath is an organic sulfonate-based electrolyte, for high speed electro-deposition of smooth fine-grained, uniform Tin bumps. The chemistry is robust enough for both bumping and capping a wide range of patterned wafers. It exhibits good post-reflow with-in die (WID) bump thickness uniformity over a wide range of wafer types, which demonstrates its suitability for high-volume manufacturing. Features Pure tin Low alpha Smooth deposit Excellent coplanarity Low surface roughness High speed

MICROFAB SN-350 is a high-speed, low alpha pure tin plating process that produces compact grain structures and smooth surface morphology, which is used for flip chip bumping and microbump applications.

Product Overview

MICROFAB SN-350 Tin bump plating bath is an organic sulfonate-based electrolyte, for high speed electro-deposition of smooth fine-grained, uniform Tin bumps. The chemistry is robust enough for both bumping and capping a wide range of patterned wafers. It exhibits good post-reflow with-in die (WID) bump thickness uniformity over a wide range of wafer types, which demonstrates its suitability for high-volume manufacturing.


Features

  • Pure tin
  • Low alpha
  • Smooth deposit
  • Excellent coplanarity
  • Low surface roughness
  • High speed
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Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Name MICROFAB ® SN-350
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