Process Dryers from JST Manufacturing, Inc.

IPA VaporDryer

IPA VaporDryer -- View Larger Image
IPA VaporDryer-Image

JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products.

Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective closed loop process. Ultra clean vapor is remotely generated and thenintroduced into a sealed drying chamber. The closed loop system allows fresh IPA vapor to rinse the surface to be dried, penetrating the surface areas and absorbing the moisture. A low pressure vacuum pulls any remaining moisture from the sealed chamber and away from the product being dried.


  • Charcoal Filter
  • Color User Interface Panel
  • Bulk Chemical Dispense


  • Meets FM Requirements
  • No Vapor Present during Load/Unload
  • Sealed Vessel with Closed Loop Process
  • Low Emissions (less than 1 lb per day)
  • Indirect Heating of IPA
  • CO2 Fire Suppression System
  • Automated Lid with Safety Interlocks
  • Meets NFPA Class I Div II

Drying Aplications

  • Silicon Wafer
  • III-Compound Wafer
  • MEMS
  • Glass Substrates
  • Disc Drives
  • Optics and more