The Process Probe 1535 instrumented wafer is ideal for process temperature monitoring of hot wall systems, and oxidizing cold wall environments.
The 1535 temperature monitoring probe can be used in a variety of equipment, over a wide range of temperatures from 0°C to 1100°C. With exceptional measurement accuracy of the 1535 temperature monitoring probe, you can tighten control parameters, reduce equipment qualification time, calibrate temperature setpoints, and optimize edge to center temperature differentials to minimize wafer stress.
The ThermaBond technique, which embeds the thermocouple sensors into the silicon, delivers unprecedented measurement accuracy and optimum reliability. The 1535 temperature monitoring probe is durable, easy- to-use, and highly versatile to ensure quality improvement.