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Provides process control information beyond one-dimensional CD.
Offers real-time site-by-site CD, height or depth, sidewall angle and profile information with each measurement for maximum productivity.
Performs thin film and CD metrology using Spectroscopic Ellipsometry (SE) technology system, enabling extensive process control feedback from a single tool.
The small spot Spectroscopic Ellipsometry design of the ASET-F5x system allows targets as small as 50x50 microns to be used, making it the first production-worthy implementation of Spectroscopic Scatterometry technology.
Improved precision and matching address requirements called for by the International Technology Roadmap.
High throughput and short MAM (move-acquire-measure) time allow for increased sampling plans necessary for process tool qualification, research and development, and 300 mm production.