For ultra-clean, highly accurate measurement of rigorous plasma etch temperatures, the 200mm i3 Integral SensorWafer provides a robust, cost effective plasma etch temperature measurement solution that will impress users with its carefree use and powerful insight into the complex reaction zone of the etching environment. The i3 Integral SensorWafer achieves this access to the process zone by embedding its thermal sensors, electronics and batteries within a silicon sandwich which is only 0.35mm (45%) thicker than a production wafer. This results in a very clean, planar design which is encapsulated for easy cleaning and can tightly emulate the true process response.
BENEFITS AND USES OF THE i3 INTEGRAL SENSORWAFER
- Process Visualization
- Tool Installation and start up
- Troubleshooting assistance
- Chamber matching
- Process optimization
- ESC qualification