Cluster-Tool Systems UNIVEX C
For special applications we can also supply cluster systems based on the UNIVEX concept. These clusters are equipped according to customer requirements and incorporate separate processing, load lock and transfer chambers.
Frequently sputter applications are involved since sputter targets remain in place for a long time and because of this, the process chambers need to be vented rarely.
Generally, each vacuum chamber will have its own high vacuum system. The load lock chamber is in the simplest case loaded manually with individual substrates. In addition, magazine processing of several substrates per batch is possible.