Combined with Nikon's superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs exceptionally precise optical inspection of wafers, photo masks, reticles and other substrates.
3 Models to Choose From
L200: Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.
L200ND: Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.
L200A: Automated version of the L200N. Frequently used operations such as aperture control, focusing, brightfield/darkfield changeover, nosepiece rotation, lamp intensity control, and DIC settings are all motorized and can be controlled by the remote controller or a PC.